Custom Nanoimprint Lithography Solutions

---

• Capabilities: UV-NIL, thermal NIL, SmartNIL® technology (fully automated high-resolution patterning)
   
• Key Features:
   
• Sub-20nm resolution with low-defect imprinting
   
• Fully automated alignment with sub-100nm overlay precision
   
• Compatible with 4", 6", and 8" wafers
   
• Integrated UV curing and temperature control
   
• Use Cases: High-fidelity pattern transfer for optics, metasurfaces, and photonics

• Capabilities: Thermal NIL with high pressure and temperature uniformity
   
• Key Features:
   
• High aspect ratio imprinting for 3D structures
   
• Supports wafer sizes up to 6"
   
• Step-and-repeat or full-wafer imprint modes
   
• Air cushion press for bubble-free imprints
   
• Use Cases: Master mold replication, pattern transfer on thermoplastics, R&D tooling

• Resist Coating Capabilities:
   
• Uniform spin-coating down to 50 nm film thickness
   
• Substrate size support: pieces up to 6" wafers
   
• UV Curing:
   
• High-intensity collimated UV light for rapid resist curing
   
• Wavelengths: 365 nm and 405 nm options
   
• Use Cases: Photoresist deposition, imprint resist curing, custom resist trials

• Bruker Dimension Icon AFM: High-resolution 3D surface imaging (sub-nm vertical resolution)
   
• Thermo Fisher SEM (Helios Series): Cross-section and surface imaging of nanoimprint features
   
• Zygo Optical Profilometer: Non-contact step height and roughness analysis
   
• Ellipsometry (J.A. Woollam): Thin film thickness and optical constant extraction

Quick-turn projects to demonstrate NIL performance for your specific use case.

• What’s included:
   
  • Custom process design (UV or thermal NIL)
     
  • Imprint trials on customer or standard substrates
     
  • Basic pattern metrology (SEM, profilometry, AFM)
     
• Typical duration: 4–8 weeks
   
• Ideal for: Universities, startups, product development teams validating NIL viability

Applied development tailored to client applications with structured milestones and regular deliverables.

• Focus Areas:
   
  • Pattern replication and resist/material compatibility
     
  • Mold optimization and surface treatment
     
  • Process tuning for specific device stacks
     
• Deliverables: Data reports, imprinted substrates, transferable process recipes
   
• Duration: 1–6 months

Short-run nanoimprint manufacturing for pre-production or demonstration purposes.

• Capabilities:
   
  • Up to 100 wafers/month (4”–6”)
     
  • Flexible substrate support (glass, Si, PET, etc.)
     
  • Integrated resist coating and curing
     
• Applications: Optics, sensors, display films, photonic surfaces
   

We selectively engage in co-development projects with partners aligned on long-term NIL innovation.

• Structure:
   
  • Joint roadmap definition
     
  • Shared access to tools and technical IP
     
  • Option for exclusive technology licenses
     
• Limited availability: Based on strategic fit and bandwidth